Abstract:Conventional lithographic methods (e.g., electron-beam lithography, photolithography) are capable of producing high-resolution structures over large areas but are generally limited to large (>1 cm(2)) planar substrates. Incorporation of these features on unconventional substrates (i.e., small (<1 mm(2)) and/or non-planar substrates) would open possibilities for many applications, including remote fiber-based sensing, nanoscale optical lithography, three-dimensional fabrication, and integration of compact optical elements on fiber and semiconductor lasers. Here we introduce a simple method in which a thin thiol-ene film strips arbitrary nanoscale metallic features from one substrate and is then transferred, along with the attached features, to a substrate that would be difficult or impossible to pattern with conventional lithographic techniques. An oxygen plasma removes the sacrificial film, leaving behind the metallic features. The transfer of dense and sparse patterns of isolated and connected gold features ranging from 30 nm to 1 mum, to both an optical fiber facet and a silica microsphere, demonstrates the versatility of the method. A distinguishing feature of this technique is the use of a thin, sacrificial film to strip and transfer metallic nanopatterns and its ability to directly transfer metallic structures produced by conventional lithography.

Atomic-layer Lithography of Sub-10-nm Plasmonic Nanogaps on Flat Metallic Surface

Tunable and scalable fabrication of plasmonic dimer arrays with sub-10 nm nanogaps by area-selective atomic layer deposition

Large-Area Plasmonic Structures Fabricated by Laser Nanopatterning and Their Applications

High-Speed Parallel Plasmonic Direct-Writing Nanolithography Using Metasurface-Based Plasmonic Lens

Fabrication of Centimeter-Scale Plasmonic Nanoparticle Arrays with Ultranarrow Surface Lattice Resonances.

2D Surface Optical Lattice Formed by Plasmon Polaritons with Application to Nanometer-Scale Molecular Deposition

Sub-wavelength patterned pulse laser lithography for efficient fabrication of large-area metasurfaces

Wafer-scale nanofabrication of sub-5 nm gaps in plasmonic metasurfaces

Fabrication of Metallic Nanopatterns with Ultrasmooth Surface on Various Substrates Through Lift-off and Transfer Process.

Forty-Nanometer Plasmonic Lithography Resolution with Two-Stage Bowtie Lens

Wafer Scale Fabrication of Highly Dense and Uniform Array of Sub-5 Nm Nanogaps for Surface Enhanced Raman Scatting Substrates.

Atomic layer deposition assisted fabrication of large-scale metal nanogaps for surface enhanced Raman scattering

A technique to transfer metallic nanoscale patterns to small and non-planar surfaces

Highly efficient and controllable method to fabricate ultrafine metallic nanostructures

Nanoscale molecular patterns fabricated by using scanning near-field optical lithography.

Plasmonic Nanogaps: From Fabrications to Optical Applications

Ultrafine and Smooth Full Metal Nanostructures for Plasmonics

Self-Aligned Plasmonic Lithography for Maskless Fabrication of Large-Area Long-Range Ordered 2D Nanostructures

Direct Nanopatterning of Complex 3D Surfaces and Self-Aligned Superlattices via Molecular-Beam Holographic Lithography

Sub-diffraction-limited Interference Photolithography with Metamaterials

High-Throughput Fabrication of Ultradense Annular Nanogap Arrays for Plasmon-Enhanced Spectroscopy