A Comparative First-Principles Study of Point Defect Properties in the Layered MX2 (M = Mo, W; X = S, Te): Substitution by the Groups III, V and VII Elements

Dan Guo,Kaike Yang,Tao Shen,Jin Xiao,Li-Ming Tang,Guanghui Zhou
DOI: https://doi.org/10.1016/j.commatsci.2018.10.004
IF: 3.572
2018-01-01
Computational Materials Science
Abstract:Dopability in semiconductors plays a crucial role in device performance. Using the first-principles density-functional theory calculations, we investigate systematically the doping properties of layered MX2 (M = Mo, W; X = S, Te) by replacing M or X with the groups III, V and VII elements. It is found that the defect B. is hard to form in MX2 due to the large formation energy originating from the crystal distortion, while Al-M is easy to realize compared to the former. In MoS2, WS2 and MoTe2, Al is the most desirable p-type dopant under anion-rich conditions among the group III components. With respect to the doping of the group V elements, it is found that the substitutions on the cation sites have deeper defect levels than those on the anion sites. As, and Sb-T(e) in MoTe2 and WTe2 are trend to form shallow acceptors under cation-rich conditions, indicating high hole-concentrations for p-type doping, whereas Sb-s in MoS2 and P-Te in WTe2 are shown to be good p-type candidates under cation-rich conditions. In despite of that the substitutions of group VII on X site have low formation energies, the transition energies are too high to achieve n-type MoS2 and WS2. Nevertheless, for MoTe2, the substitutions with the group VII elements on the anion sites are suitable for n-type doping on account of the shallow donor levels and low formation energies under Mo-rich condition. As to WTe2, F is the only potential donor due to the shallow transition energy of F-Te. Our findings of filtering out unfavorable and identifying favorable dopants in MX2 are very valuable for experimental implementations.
What problem does this paper attempt to address?