Abstract:The self-assembly of ultra-high molecular weight (UHMW) block copolymers (BCPs) remains a complex and time-consuming endeavor owing to the high kinetic penalties associated with long polymer chain entanglement. In this work, we report a unique strategy of overcoming these kinetic barriers through precision solvent annealing of an UHMW polystyrene-block-poly(2-vinylpyridine) BCP system (Mw: ∼800 kg/mol) by fast swelling to very high levels of solvent concentration (ϕs). Phase separation on timescales of ∼10 min is demonstrated once a thickness-dependent threshold ϕs value of ∼0.80–0.86 is achieved, resulting in lamellar feature spacings of over 190 nm. The threshold ϕs value was found to be greater for films with higher dry thickness (D0) values. Tunability of the domain morphology is achieved through controlled variation of both D0 and ϕs, with the kinetically unstable hexagonal perforated lamellar (HPL) phase observed at ϕs values of ∼0.67 and D0 values of 59–110 nm. This HPL phase can be controllably induced into an order–order transition to a lamellar morphology upon further increase of ϕs to 0.80 or above. As confirmed by grazing-incidence small-angle X-ray scattering, the lateral ordering of the lamellar domains is shown to improve with increasing ϕs up to a maximum value at which the films transition to a disordered state. Thicker films are shown to possess a higher maximum ϕs value before transitioning to a disordered state. The swelling rate is shown to moderately influence the lateral ordering of the phase-separated structures, while the amount of hold time at a particular value of ϕs does not notably enhance the phase separation process. These large period self-assembled lamellar domains are then employed to facilitate pattern transfer using a liquid-phase infiltration method, followed by plasma etching, generating ordered, high aspect ratio Si nanowall structures with spacings of ∼190 nm and heights of up to ∼500 nm. This work underpins the feasibility of a room-temperature, solvent-based annealing approach for the reliable and scalable fabrication of sub-wavelength nanostructures via BCP lithography.The Supporting Information is available free of charge at <a class="ext-link" href="/doi/10.1021/acs.macromol.0c02543?goto=supporting-info">https://pubs.acs.org/doi/10.1021/acs.macromol.0c02543</a>.Estimation of the partial pressures of THF/chloroform mixtures inside the SVA chamber; calculation of refractive index of swollen film; additional swelling plots; additional AFM and SEM data; optical micrographs of BCP films post SVA; correlation length example; and feature height variation with etch time (<a class="ext-link" href="/doi/suppl/10.1021/acs.macromol.0c02543/suppl_file/ma0c02543_si_001.pdf">PDF</a>)This article has not yet been cited by other publications.

The Solvent Distribution Effect on the Self-Assembly of Symmetric Triblock Copolymers During Solvent Vapor Annealing

Effect of the Nature of Annealing Solvent on the Morphology of Diblock Copolymer Blend Thin Films

Directed Self-Assembly of Ternary Blends of Block Copolymer and Homopolymers on Chemical Patterns

Solvent-Induced Morphology of the Binary Mixture of Diblock Copolymer in Thin Film: the Block Length and Composition Dependence of Morphology

Solvent selectivity governed self-assembly of block copolymer in nanofabrication

Revealing the Kinetic Phase Behavior of Block Copolymer Complexes Using Solvent Vapor Absorption-Desorption Isotherms

Morphologies in Solvent-Annealed Thin Films of Symmetric Diblock Copolymer

Morphology Change of Asymmetric Diblock Copolymer Micellar Films During Solvent Annealing

Self-assembly Behaviour of Amphiphilic Diblock Copolymer in Selective Solvents Studied by Synchrotron Small-Angle X-Ray Scattering

Optimization and Control of Large Block Copolymer Self-Assembly via Precision Solvent Vapor Annealing

Solvent-Induced Microphase Separation In Diblock Copolymer Thin Films With Reversibly Switchable Morphology

Dissipative Particle Dynamics Simulation on the Self-Assembly of Linear Abc Triblock Copolymers under Rigid Spherical Confinements

Hierarchical Self‐Assembly of Polyethylene Midblock Copolymers in Hot Steam: Key Role of Crystalline and Topological Structure

Solvent Effect in the Copolymerization of Ethylene and Vinyl Acetate

Self-assembly of Poly(vinylidene Fluoride)–polystyrene Block Copolymers in Solution: Effects of the Length of Polystyrene Block and Solvent Compositions

Annealing Process Dependence of the Self-Assembly of Rod–Coil Block Copolymer Thin Films

Solvent Induced Sphere Development in Symmetric Diblock Copolymer Thin Films

Polymerization-induced Self-Assembly of Liquid Crystalline ABC Triblock Copolymers with Long Solvophilic Chains

Development of Nanodomain and Fractal Morphologies in Solvent Annealed Block Copolymer Thin Films

Depletion-induced Surface Alignment of Asymmetric Diblock Copolymer in Selective Solvents.

Effect of Solvent on Convectively Driven Silica Particle Assembly: Decoupling Surface Tension, Viscosity, and Evaporation Rate