Enhanced Mechanical and Electrochemical Properties of TiNx Thin Films Prepared by Magnetron Sputtering with an Anode Layer Ion Source

Abdul Mateen Qasim,Farhat Ali,Hao Wu,Ricky K. Y. Fu,Shu Xiao,Yunpo Li,Zhongzhen Wu,Paul K. Chu

DOI: https://doi.org/10.1016/j.surfcoat.2018.07.076

2019-01-01

Abstract:An anode layer ion source (ALIS) is used in magnetron sputtering to deposit TiN films. The effects of the ion source discharge current (I-s) on the microstructure, mechanical, and electrochemical properties, and adhesion characteristics of the deposited films are studied. By coupling with magnetron sputtering discharge (I-t) and varying the ALIS discharge current, the ion energy (E-i) and ion flux density (J(i)) can be increased to 180 eV and 3.5 x 10(16) ions.cm(-2) .S-1, respectively. The preferred orientation of the films changes from (200) to mixed (111) & (200) and finally to (111) with increasing I-s. The microstructure changes from a columnar to dense one and the residual stress in all the films is compressive. The stress increases initially and then decreases slightly with the (111) orientation and the hardness and fracture toughness depend on the residual stress with the hardness increasing from 14.5 GPa to 27.0 GPa and fracture toughness increasing to 70%. As shown by the Rockwell C adhesion test, the films deposited by varying the ion source discharge current show improved adhesion. Electrochemical studies reveal reduced corrosion current density and increased impedance by an order of magnitude. The results reveal for the first time significant changes in the mechanical and electrochemical properties of films deposited by magnetron sputtering with ALIS assistance. This hybrid technique has the advantages that the film structure and mechanical and electrochemical properties can be readily adjusted.