Abstract:This study proposes two atomic force microscope (AFM) tip-based direct nanoscratching methods including single-pass scratching and multi-pass scratching compared with a vibration-assisted scratching method to fabricate nano-grooves on the surface of the polymethylmethacrylate (PMMA) thin-film resist. In order to protect the AFM tip from wearing and optimize the subsequent etching process, the machined depth is expected slightly less than the PMMA thickness to prevent the tip directly contacting with the silicon substrate and obtain better process results. First, single-pass scratching tests are performed on films with different thickness employing varied normal loads. Results show that the machined depths of the grooves cannot be obtained slightly less than the thickness of the film very easily when scratching with single-pass method, 50-120 nm in the present study, which may not be very suitable for the following etching process. Multi-pass and vibration-assisted methods are then utilized to solve this limitation of the machined depth in single-pass process. The machined depths using the multi-pass method are dependent on scratching times and the applied normal loads. Moreover, the depth closed to the thickness of the film can be obtained by enlarging the number of the scratching cycles. However, with a longer scratching time, large tip wear can be found. For vibration assisted method, the machined depths are controlled by the vibration amplitude and the applied normal load. With the vibration in z direction increasing, the machined depth can be enlarged comparing with the single-pass, which makes the fabrication process be feasible. In addition, the vibration-assisted method contributes to less tip wear during the machining process. (C) 2015 Elsevier B.V. All rights reserved.

Energy Dissipation Contributed on the Machined Depth Via Dynamic Plowing Lithography of Atomic Force Microscopy

Transient Ablation Model for Laser Machining Polymer Microfluidic Chip

Dynamic Interface for Three-Dimensional Transient Laser Ablation Polymer Microchannels

Characterization Study on Machining PMMA Thin-Film Using AFM Tip-Based Dynamic Plowing Lithography

Study on the Effects of the Machining Parameters on the Fabrication of Nanoscale Pits Using the Dynamic Plowing Lithography Approach

Fabrication of None-Ridge Nanogrooves with Large-Radius Probe on Pmma Thin-Film Using Afm Tip-Based Dynamic Plowing Lithography Approach

Study on Mechanism for Material Removal and Surface Generation by Molecular Dynamics Simulation in Abrasive Processes

Molecular Dynamics and Experimental Study on Comparison Between Static and Dynamic Ploughing Lithography of Single Crystal Copper

Direct Measurement of Plowing Friction and Wear of a Polymer Thin Film Using the Atomic Force Microscope

Effects of AFM Tip-Based Direct and Vibration Assisted Scratching Methods on Nanogrooves Fabrication on a Polymer Resist

Study on Material Removal for Nanochannels Fabrication Using Atomic Force Microscopy Tip-Based Nanomilling Approach

Fabrication of Periodic Nanostructures Using Dynamic Plowing Lithography with the Tip of an Atomic Force Microscope

Nanoscale manipulation of materials patterning through thermomechanical nanolithography using atomic force microscopy

Modelling and experimental study of nanoscratching process on PMMA thin-film using AFM tip-based nanomachining approach

Investigation on friction behavior and processing depth prediction of polymer in nanoscale using AFM probe-based nanoscratching method

The Effects of Feedback Control Parameters on the Formation of Protuberances in Poly(methyl Methacrylate) by Dynamic Plowing Lithography

Fabrication of Nanoscale Pits with High Throughput on Polymer Thin Film Using AFM Tip-Based Dynamic Plowing Lithography

Printing Depth Modeling, Printing Process Quantification and Quick-Decision of Printing Parameters in Micro-Vat Polymerization

Md Analysis on Tip Geometry Effects in Afm-Based Lithography Process

Effects of Diamond Tip Orientation on the Dynamic Ploughing Lithography of Single Crystal Copper

Blunting and wear of AFM tips during dynamic lithography