TiO2 Coatings Via Atmospheric-Pressure Plasma-Enhanced Chemical Vapor Deposition for Enhancing the UV-Resistant Properties of Transparent Plastics.

Jing Xu,Hiroki Nagasawa,Masakoto Kanezashi,Toshinori Tsuru
DOI: https://doi.org/10.1021/acsomega.0c04999
IF: 3
2018-01-01
Materials Letters
Abstract:Herein, TiO2 coatings were deposited on photo-degradable polymers for protection from UV irradiation using the atmospheric-pressure plasma-enhanced chemical vapor deposition (AP-PECVD) technique. Polymethylmethacrylate (PMMA) and polycarbonate (PC) substrates were coated with titanium tetraisopropoxide as the precursor in an open-air atmospheric-pressure nonequilibrium argon plasma jet. The AP-PECVD-derived TiO2 coatings exhibited good adhesion to PMMA and PC. The TiO2 coatings could shield more than 99% of UV light in the wavelength range of 200-300 nm, without affecting the transmittance of visible light. UV irradiation tests on polymer films demonstrated that the degradation rates of PMMA and PC were significantly reduced by one-tenth after they were coated with TiO2 films.
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