Multistate Storage Nonvolatile Memory Device Based on Ferroelectricity and Resistive Switching Effects of SrBi2Ta2O9 Films

Zhiwei Song,Gang Li,Ying Xiong,Chuanpin Cheng,Wanli Zhang,Minghua Tang,Zheng Li,Jiangheng He
DOI: https://doi.org/10.1088/1361-6641/aaba26
IF: 2.048
2018-01-01
Semiconductor Science and Technology
Abstract:A memory device with a Pt/SrBi2Ta2O9(SBT)/Pt(111) structure was shown to have excellent combined ferroelectricity and resistive switching properties, leading to higher multistate storage memory capacity in contrast to ferroelectric memory devices. In this device, SBT polycrystalline thin films with significant (115) orientation were fabricated on Pt(111)/Ti/SiO2/Si(100) substrates using CVD (chemical vapor deposition) method. Measurement results of the electric properties exhibit reproducible and reliable ferroelectricity switching behavior and bipolar resistive switching effects (BRS) without an electroforming process. The ON/OFF ratio of the resistive switching was found to be about 10(3). Switching mechanisms for the low resistance state (LRS) and high resistance state (HRS) currents are likely attributed to the Ohmic and space charge-limited current (SCLC) behavior, respectively. Moreover, the ferroelectricity and resistive switching effects were found to be mutually independent, and the four logic states were obtained by controlling the periodic sweeping voltage. This work holds great promise for nonvolatile multistate memory devices with high capacity and low cost.
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