Simultaneously High Thermal Stability and Low Power Based on Ti-Doped Ge2Sb2Te5 Thin Films

Yifeng Hu,Rui Zhang,Tianshu Lai,Xiaoqin Zhu,Hua Zou,Zhitang Song
DOI: https://doi.org/10.1149/2.0121712jss
IF: 2.2
2017-01-01
ECS Journal of Solid State Science and Technology
Abstract:Compared with Ge2Sb2Te5, Ti-doped Ge2Sb2Te5 has better amorphous thermal stability (activation energy of 4.65 eV) and data retention (165 degrees C for 10-year). The crystallization is restrained by the added Ti atoms with smaller grains. A faster SET/RESET switching speed (12 ns) and a lower RESET voltage (2.67 V) are obtained. The results indicate that Ti-doped Ge2Sb2Te5 material has the excellent potential for high-density application in phase change memory. (c) 2017 The Electrochemical Society. All rights reserved.
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