Tuning The Transport Behavior Of Centimeter-Scale Wte2 Ultrathin Films Fabricated By Pulsed Laser Deposition

Ming Gao,Minhao Zhang,Wei Niu,Yequan Chen,Min Gu,Haoyu Wang,Fengqi Song,Peng Wang,Shicheng Yan,Fengqiu Wang,Xinran Wang,Xuefeng Wang,Yongbing Xu,Rong Zhang
DOI: https://doi.org/10.1063/1.4995227
IF: 4
2017-01-01
Applied Physics Letters
Abstract:We report on an avenue to obtain the centimeter-scale, uniform, and high-quality WTe2 ultrathin films by a pulsed laser deposition technique and the post-annealing under the tellurium (Te) vapor. The WTe2 ultrathin films showed the typical metallic behavior when Te vacancies were mostly eliminated. Magnetoresistance measurements showed that WTe2 ultrathin films underwent the competition between weak localization and weak antilocalization that could be modulated by the amount of Te vacancies. Our study may open an avenue to improve the charge transport of WTe2 for its two-dimensional device applications. Published by AIP Publishing.
What problem does this paper attempt to address?