Abstract:In this study, spray pyrolysis was used to produce nanostructured NiO thin films from high purity nickel acetate (Ni(CH3COO)2.3H2O) precursors on pre-heated ultrasonically cleaned soda-lime glass substrates. The metallic constituent concentrations in the films were varied, and the precursors were produced in distilled water at various molarities ranging from 0.1 to 0.4 M. In the study, the field-emission scanning electron microscope (FESEM) results strongly confirmed adherence of the films to the glass substrate at 350 °C. The presence of Ni and O in the samples was confirmed using Rutherford backscattering spectroscopy (RBS), X-ray diffractometry (XRD) and energy dispersive X-ray spectroscopy (EDX). For the 0.1 M NiO thin films, the thickness was approximately 43 nm, and for the 0.2 M, 0.3 M, and 0.4 M films, the thickness was 46 nm, 47 nm, and 49 nm, respectively. The XRD findings were supported by the increased Raman intensity peaks with increased precursor concentration, which confirmed the films' improved crystallinity. For the same number of passes of films deposition, as the molar concentration increases, the films thickness increases. The amount of nickel in NiO thin films increases as the molarity increases, but the amount of oxygen in NiO thin films decreases as the molarity increases. It was discovered that as molarity increases, the optical transmittance decreases and the optical band gap narrows. The qualities of NiO discovered in this study suggest the films' potentials for usage as window layer and buffer material in thin film solar cells.

The Effect of the Oxygen Ratio Control of DC Reactive Magnetron Sputtering on As-Deposited Non Stoichiometric NiO Thin Films

Effects of atomic oxygen on the growth of NiO films by reactive magnetron sputtering deposition

Effect of sputtering pressure and oxygen content on the electrochromic properties of NiO films by DC magnetron sputtering

Investigation on tailoring physical properties of Nickel Oxide thin films grown by dc magnetron sputtering

Tunable Electrical Properties of NiO Thin Films and P-Type Thin-Film Transistors

Modulation of the conductive behavior of NiO thin film deposited by HiPIMS through varying the O2 flow ratio

Properties of the Highly Textured (200) NiO Thin Film Deposited by RF Magnetron Sputtering

Interface Study on the Effect of Oxygen/nitrogen Ratio in Ni/Ti Multilayer Deposited by Reactive Sputtering

Characterizations of Nickel Oxide Thin Films Prepared by Reactive Radio Frequency Magnetron Sputtering

Effects of Gas Parameters on Properties of In2O3 Thin Films Deposited by Magnetron Sputtering

Thermal, structural and optical properties of NiOx thin films deposited by reactive dc-magnetron sputtering

Argon and oxygen pressure influence on the properties of NiO films deposited by magnetron sputtering in layer-by-layer growth regime

Fabrication and characterization of NiO films for energetic nano-multilayers by direct current reactive sputtering

Effect of precursor concentration on stoichiometry and optical properties of spray pyrolyzed nanostructured NiO thin films

Structural and optical characterization of NiO polycrystalline thin films fabricated by spray-pyrolysis

Effect of Oxygen-Evaporation-Preventative Post-Annealing Gas Conditions on NiO Thin Films

XPS study of NiO thin films obtained by chemical vapor deposition

Preparation and Properties of NiO Films Via Sol-gel Process and Spin-coating

The influence of substrate temperature on the structure and optical properties of NiO thin films deposited using the magnetron sputtering in the layer-by-layer growth regime

Annealing Temperature Effect on the Physical Properties of NiO Thin Films Grown by DC Magnetron Sputtering (Adv. Mater. Interfaces 9/2024)

Structural and chemical properties of NiOx thin films: the role of oxygen vacancies in NiOOH formation in a H2O atmosphere