The Annealing Behavior of Cu Nanoparticles in Ar-ion Implanted Spinel
Yitao Yang,Chonghong Zhang,Bingsheng Li,Liqing Zhang,Luhui Han,Yong Zhang,Xiujun Jia,Chaoliang Xu
DOI: https://doi.org/10.1016/j.nimb.2010.05.064
IF: 1.279
2010-01-01
Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms
Abstract:Magnesium aluminate spinel crystals (MgAl2O4 (110)) deposited with 30nm Cu film on surface were implanted with 110keV Ar-ions to a fluence of 1.0×1017 ions/cm2 at 350°C, and then annealed in vacuum condition at the temperature of 500, 600, 700, 800 and 900°C for 1h, respectively. Ultraviolet–visible spectrometry (UV–VIS), scanning electron microscopy (SEM), Rutherford backscattering (RBS) and transmission electron microscopy (TEM) were adopted to analyze the specimens. After implantation, the appearance of surface plasmon resonance (SPR) absorbance peak in the UV–VIS spectrum indicated the formation of Cu nanoparticles, and the TEM results for 500°C also confirmed the formation of Cu nanoparticles at near-surface region. In annealing process, The SPR absorbance intensity increased at 500 and 700°C, decreased with a blue shift of the peak position at 600 and 800°C, and the peak disappeared at 900°C. The SPR absorbance intensity evolution with temperature was discussed combined with other measurement results (RBS, SEM and TEM).