Modulation of Band Offset in Sputtering-Derived MoS2/HfO2 Heterojunction by Gd Incorporation

W. D. Li,Gang He,C.Y. Zheng,D. Q. Xiao,P. Jin,S. S. Jiang,J. Gao,J. G. Lv
DOI: https://doi.org/10.1166/sam.2017.3072
2017-01-01
Science of Advanced Materials
Abstract:The effect of Gd incorporation on the energy band alignment of sputtering-derived MoS2/HfO2 interface has been systematically investigated by X-ray photoelectron spectroscopy. A valence band offset (Delta E-v) of 2.31 eV and a conduction band offset (Delta Ec) of 2.43 eV were obtained for the MoS2/HfO2 interface without any treatment. After Gd incorporation, a Delta E-v and a Delta E-c across the MoS2/HfO2 interface were found to be 2.12 eV and 2.91 eV, respectively. The band alignment difference is believed to be dominated by the electron affinity and charge neutrality level, which caused by the incorporation of Gd. The increased Delta E-c and band gap indicates that Gd-incorporated HfO2 high-k gate dielectric will benefit the n-type MoS2 based field effect transistors (FETs) in terms of suppressing the gate leakage current.
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