Development and Application of Laser Direct Writing Lithography Technology(Invited)
Linsen Chen,Wenbin Huang,Donglin Pu,Wen Qiao,Fengbin Zhou,Bowen Sui,Zh Meng
DOI: https://doi.org/10.3788/cjl240664
2024-01-01
Abstract:SignificanceThe significance of laser direct writing lithography technology lies in its unique ability to harness the power of light as a medium for fabricating advanced functional materials and devices. This technology not only offers a gateway to explore the unknown ealm of optoelectronics but also serves as a bridge to achieve higher manufacturing goals. The micro-nano structures and arrangements created via laser direct writing exhibit novel characteristics, phenomena, and mechanisms, providing crucial insights into the development of new materials and devices. As such, laser direct writing holds immense potential in driving the advancement and application of innovative optoelectronic devices and materials.In the current technological revolution, the demand for high-performance, miniaturized, and multifunctional devices is constantly increasing. Laser direct writing lithography technology meets these demands by enabling the precise and controllable fabrication of micro-nano structures with complex geometries and compositions. This technology has the potential to revolutionize various fields,including flexible touch sensors, microwave antennas, thin-film imaging devices,3D display panels, and virtual-real fusion optics.Therefore, the significance of laser direct writing lithography technology lies not only in its scientific and technological advancements but also in its potential to transform various industries and societal applications.ProgressSignificant progress has been made in the field of laser direct writing lithography technology in recent years. Researchers have developed innovative methods and techniques to enhance the precision, resolution, and speed of fabrication processes. One of the key advancements is the development of high-powered lasers with optimized beam profiles, as these lasers enable the creation of complex micro-nano structures with improved accuracy and reproducibility. Moreover, advancements in materials science have led to the development of novel materials that are compatible with laser direct writing lithography. These materials exhibit unique optical,electrical, and mechanical properties and enable the creation of devices with enhanced performance and functionality.In addition, the integration of laser direct writing lithography with other advanced manufacturing techniques, such as nanoimprint lithography and roll-to-roll processing, has further broadened its scope of applications. This integration allows for the efficient and scalable production of micro-nano structures on large-area substrates and paves the way for commercialization and industrialization.Researchers have also explored the use of laser direct writing lithography in the fabrication of novel optical elements and devices. For instance, the creation of diffractive optical elements with customized phase profiles has enabled the realization of novel imaging and display systems with enhanced performance. Similarly, the fabrication of photonic crystals and metasurfaces via laser direct writing has led to the development of compact and efficient optical components for various applications.Conclusions and ProspectsIn conclusion, laser direct writing lithography technology has emerged as a powerful tool for fabricating advanced functional materials and devices. Its ability to create complex micro-nano structures with novel properties offers immense potential in various fields, including optoelectronics, photonics, and materials science. Significant progress has been made in this field in terms of advancements in laser technology, materials science, and integration with other manufacturing techniques.Looking ahead, there are several promising directions for further research and development. One area of interest is the exploration of novel materials and structures that can be fabricated via laser direct writing lithography. This includes the development of materials with enhanced optical, electrical, and mechanical properties as well as the design of novel micro-nano structures with unique functionalities.Another important direction for future research is the optimization of the fabrication process to achieve higher precision,resolution, and speed. This optimization can be achieved via the development of advanced laser systems, improved beam control techniques, and the integration of machine learning and artificial intelligence algorithms for process optimization. Furthermore, the application of laser direct writing lithography in emerging fields, such as quantum computing, biophotonics, and flexible electronics,offers exciting opportunities for future research. The ability to fabricate complex nanostructures with precise control over their properties and arrangements holds the key to unlocking the full potential of these fields.In summary, the future of laser direct writing lithography technology is bright, with vast possibilities for scientific discovery and technological innovation. With continued efforts and advancements, laser direct writing lithography technology is expected to revolutionize various industries and societal applications as well as lead to the creation of novel devices and systems with unprecedented performance and functionality