Growth Dynamics and Carrier Control of the Third Generation Semiconductor with Large Mismatch and Strong Polarization

WANG Xin-qiang,LI Da-bing,LIU Bin,SUN Qian,ZHANG Jin-cheng
DOI: https://doi.org/10.3788/fgxb20163711.1305
2016-01-01
Abstract:High quality GaN-based material system is the basis of developing the third generation semiconductor optoelectronic and microelectronic devices. The GaN-based materials and quantum structures have the properties of large mismatch, strong polarization, and nonequilibrium growth. The research on growth dynamics and carrier control of GaN-based material has important research significance and practical value, and is attracting the attention of scientific and industrial communi-ties. In this paper, the growth dynamics and carrier control of GaN-based material with large mismatch and strong polarization is investigated, in order to get over the bottle-neck of low emitting efficiency of blue light, break through the difficulty of fabricating GaN-based material with high Al-and high In-composition, and achieve high mobility of heterostructure material and high quantum ef-ficiency of optoelectronic devices. By the fabrication of emitting devices with high-efficiency multi-wavelength and electronic devices with high-frequency high-breakdown, the technology innovation, industrial transformation and upgrade can be realized.
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