Synthesis of wafer-scale WSe<inf>2</inf> by WO<inf>x</inf> selenization on SiO<inf>2</inf> / Si substrates

Yung-Ching Chu,Chao-An Jong,Yen-Teng Ho,Ming Zhang,Po-Yen Chien,Hung-Ru Hsu,Hung-Yi Chen,Yung-Yi Tu,Krishna Pande,Jason C. S. Woo,Edward Yi Chang
DOI: https://doi.org/10.1109/SNW.2016.7577982
2016-01-01
Abstract:Scalable synthesis of thin tungsten diselenide (WSe <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</inf> ) films on 4-inch silicon substrate with 80 nm silicon dioxide (SiO <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</inf> ) is demonstrated. Cross-sectional transmission electron microscopy (TEM) reveals good control of WSe <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</inf> layers. Raman spectroscopy confirms high quality crystal of WSe <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</inf> is achieved. Back-gated field-effect transistors (FETs) fabricated on these thin films exhibit p-channel characteristics with a good on/off current ratio larger than 1.2 × 10 <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> .
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