Enhancement of Hardness and Thermal Stability of W-doped Ni3Al Thin Films at Elevated Temperature

Chao Zhang,Kai Feng,Zhuguo Li,Fenggui Lu,Jian Huang,Yixiong Wu,Paul. K. Chu
DOI: https://doi.org/10.1016/j.matdes.2016.09.039
IF: 9.417
2016-01-01
Materials & Design
Abstract:Nanocrystalline (NC) Ni3Al thin films have poor mechanical properties at a high temperature and in order to improve the thermal performance, it is necessary to develop novel micro- or nanostructures that endow the coatings with both high thermal stability and hardness. In this work, Ni3Al thin films with different W concentrations up to 12.5at% are deposited on Si/SiO2 substrates by magnetron sputtering and then vacuum-annealed at 500°C and 700°C. Addition of W to the nanostructured Ni3Al thin films leads to grain refinement and high thermal stability. The hardness (H) of the film with 12.5at% W annealed at 700°C increases by 355% compared to pure Ni3Al. X-ray diffraction and transmission electron microscopy reveal non-equilibrium phases such as the amorphous phase and supersaturation solid solution in the films annealed at 500°C. After annealing at 700°C, the α-W phase precipitated in the fine nanocrystalline state plays a crucial role in the high thermal stability of the nano-grains as well as enhanced hardness. The results suggest that these durable Ni-based coatings are suitable for applications at high temperature.
What problem does this paper attempt to address?