Chemical Insights into Plasma-Assisted Dry Reforming of Methane in a Nanosecond Discharge
Haodong Chen,Zhongkai Liu,Zhaoying Li,Ruzheng Zhang,Jiuzhong Yang,Nils Hansen,Bin Yang
DOI: https://doi.org/10.1016/j.proci.2024.105404
IF: 6.535
2024-01-01
Proceedings of the Combustion Institute
Abstract:The present study explores the chemical kinetics of plasma-assisted dry reforming of methane (340 K, 30 Torr) in a flow reactor activated by a nanosecond pulsed dielectric barrier discharge (DBD). Experiments are conducted with the inlet CO2/CH4 mol ratios varying from 0.4 to 2.8 in CH4/CO2/Ar mixture. Synchrotron vacuum ultraviolet photoionization mass spectrometry (SVUV-PIMS) is employed for detailed species measurement of the ions, radicals, and molecules in this system. Eight ions are observed, including CH3+, O+, CH4+, Ar2+, CO+, C2H4+, Ar+, and CO2+. The identification of several intermediate species and products are achieved based on the photoionization efficiency (PIE) spectra, such as methyl radical (CH3), water (H2O), acetylene (C2H2), carbon monoxide (CO), ethylene (C2H4), formaldehyde (CH2O), methanol (CH3OH), ketene (CH2CO), and acetone (CH3COCH3). Species mole fraction profiles as a function of inlet CO2 concentrations are obtained. The present work provides a unique dataset and enriches our understanding of the kinetics of plasma-assisted dry reforming of methane. A kinetic mechanism incorporating plasma reactions and combustion reactions is developed for this system, and its prediction performance of the product selectivity is validated against the experimental data. The main reaction pathways for the consumption of CH4 and CO2 and the formation of products and intermediates are indicated based on the rate of production (ROP) analysis. The ionic reactions are predominant for CH4 consumption, leading to CH4+ and CH5+, while CH4 reactions with electrons and Ar* contribute to CH2 and CH3 formation. CO2 mainly reacts with electrons and Ar*, producing CO, and can also undergo reactions with CH4+ and CH5+, forming HCO2+. The principal formation pathways for H2, CO, CH2O, and CH3OH are discussed. A competition between the discharge pathways and oxygen-containing pathways in CH4/CO2/Ar plasma is proposed.