EFFECT OF THE ANNEALING TEMPERATURE ON MICROSTRUCTURE AND PROPERTIES OF MO TARGETS

Guo-jun ZHANG,Jie MA,Geng AN,Yuan-jun SUN
DOI: https://doi.org/10.13384/j.cnki.cmi.1006-2602.2014.05.010
2014-01-01
Abstract:The effects of annealing temperature on microstructure, hardness and I-U curve of Mo sputtering targets were studied by means of quantitative metallographic techniques and hardness test. The results show that the grain size of Mo targets increases with increasing annealing temperature, as well as hardness of targets declined. The Mo target with annealing process of 1 200 ℃ for 1 hour has the most uniform organization. All the targets’ I-U curves are in line with the Thornton experiential formula, and the Mo target annealed in 1 200 ℃ has the best magnetron sputtering discharge performance.
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