First-Principles Study of Structural and Electronic Properties of XeF2 Crystal under High Pressure

Dalin LIAO,Zuo LI,Pu WANG,Xinlu CHENG
DOI: https://doi.org/10.3969/j.issn.1001-8395.2013.06.019
2013-01-01
Abstract:Xenon fluoride( XeF2) crystal is an important chemical etching and laser device material. In this paper pressure-volume( p-V) relationship of XeF2crystals has been obtained in the range of 0 ~ 120 GPa using the molecular dynamics simulations,based on the generalized gradient approximation( GGA) and local density approximation( LDA) of density functional theory( DFT).The results show that at the low pressure the crystal data of XeF2gotten by two methods are in good agreements with experimental data.Meanwhile,changes of density of states of atoms under high pressure have been analyzed. The relationship between pressure and the band gap of XeF2crystal has been obtained,indicating that XeF2crystal is a semiconductor material under high pressure. Studying its variation under high pressure has a certain reference value for the experimental investigation.
What problem does this paper attempt to address?