Investigation of Surfactant Concentration Effect on the Mesostructure and Dielectric Properties of Mesoporous Silica Films

吴兆丰,吴广明,姚兰芳
DOI: https://doi.org/10.3969/j.issn.1671-5322.2004.04.003
2004-01-01
Abstract:A novel route to prepare mesoporous SiO2 films is reported in this paper. The influence of CTAB concentration on the structure and properties of mesoporous silica films is studied as well. Silicate sols are prepared with the precursor TEOS and template CTAB catalyzed by hydrochloric acid. The films are prepared by Dip-coating process. FTIR, XRD and AFM are used to characterize the films.The refractive index and dielectric constant are measureed by Ellipsometer and impedance analysis apparatus. It has been found that the films have low dielectric constant and good mechanical properties. Preliminary results present a very positive prospective for intermetal dielectric applications.
What problem does this paper attempt to address?