Progress in Research on Low Dielectric Constant-nanoporous Silica Films

杨大祥,冯坚,周新贵,张长瑞,王娟
DOI: https://doi.org/10.3969/j.issn.1001-2028.2004.09.015
2004-01-01
Abstract:Nanoporous silica films with a great potential for applications in the near future are one of the best insulated midium which could be applied in interconnect system of super large-scale integration (ULSI) and high-capability, high-power microwave apparatus. The fabrication and the character of NPS films were introduced, the detection methods, the progress at home and abroad were reviewed and the disadvantage of NPS films and the problems that should be further studied were discussed.
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