Influences of Metal Oxide Encapsulation by Atomic Layer Deposition on the Sensitivities of Octogen

Qin Lijun,Gong Ting,Hao Haixia,Wang Keyong,Feng Hao

DOI: https://doi.org/10.7503/cjcu20141009

2015-01-01

Abstract:Micron-scale Octogen (HMX) particles were coated by alumina and zinc oxide thin films via atomic layer deposition (ALD). The surface chemical compositions and morphologies of ALD metal oxides coated HMX particles were characterized by X-ray photoelectron spectroscopy (XPS) and scanning electron microscopy (SEM). The thermal decomposition behaviors of the fabricated HMX particles were analyzed by differential scanning calorimetry (DSC) and thermogravimetry (TG) techniques. The mechanical sensitivity and electrostatic spark sensitivity of the metal oxides coated HMX were tested. The influences of film composition and thickness on the sensitivities of HMX were analyzed. The results indicate that the HMX particles are completely and uniformly encapsulated by ALD alumina or zinc oxide thin films. The thickness of the encapsulation layer can be precisely controlled in nanometer-scale. The thin films of metal oxides have little influence on the thermal decomposition properties of HMX. Due to the hardness of the metal oxides, ALD encapsulation layers do not decrease the mechanical sensitivity of HMX. However, the inorganic ALD coatings increase the surface electrical conductivity of HMX particles and therefore reduce the electrostatic spark sensitivity.