Fabrication and Characterization of In-Situ Duplex Plasma-Treated Nanocrystalline Ti/AlTiN Coatings

Chaolin Tan,Tongchun Kuang,Kesong Zhou,Hongmei Zhu,Yang Deng,Xueping Li,Panpan Cai,Zongwen Liu
DOI: https://doi.org/10.1016/j.ceramint.2016.03.207
IF: 5.532
2016-01-01
Ceramics International
Abstract:Plasma nitriding and plasma-assisted PVD duplex treatment was adopted to improve the load-bearing capacity, fatigue resistance and adhesion of the AlTiN coating. Ion etch-cleaning was applied for better adhesion before plasma nitriding. After plasma nitriding Ti interlayer was in-situ deposited by high power impulse magnetron sputtering (HIPIMS), followed by the AlTiN coating through in-situ deposition by advanced plasma-assisted arc (APA-Arc). The microstructure and properties of the duplex-treated coating were carefully characterized and analyzed. The results show that the thicknesses of the nitriding zone, the γ′-Fe4N compound layer, the Ti interlayer and the AlTiN top layer with nanocrystalline microstructures are about 60μm, 2–3μm, 100nm and 6.1μm, respectively. The nitriding rate is about 30μm/h and the AlTiN coating deposition rate reaches 6.1μm/h. The interfacial adhesion of the Ti/AlTiN coating is well enhanced by ion etch-cleaning and a Ti interlayer, and the load-bearing capacity is also improved by duplex treatment. In addition, the instinct hardness of the Ti/AlTiN coating reaches 3368HV0.05 while the wear rate coefficient of 5.394×10−8mm−3/Nm is sufficiently low. The Ti/AlTiN coating, which possesses a high corrosion potential (Ecorr=−104.6mV) and a low corrosion current density (icorr=4.769μA/cm2), shows highly protective efficiency to the substrate.
What problem does this paper attempt to address?