Stable Electrical Performance Observed in Large-Scale Monolayer Wse2(1-X)S2x with Tunable Band Gap

Jian Huang,Wenhui Wang,Qi Fu,Lei Yang,Kun Zhang,Jingyu Zhang,Bin Xiang
DOI: https://doi.org/10.1088/0957-4484/27/13/13lt01
IF: 3.5
2016-01-01
Nanotechnology
Abstract:Two-dimensional (2D) semiconductor materials have attracted broad interest due to their unique structures and physical properties. The stability of the 2D-material-based devices plays a key role in their practical applications. Here, we report the promising stable electrical performance in the large-scale monolayer WSe2(1-x)S2x with a tunable band gap. Photoluminescence (PL) spectroscopy was utilized to verify the tunable band gap in the as-grown monolayer with a tuning capability of 120 meV. Gated field effect transistor (FET) performance confirmed the p-type transport behavior in monolayer WSe2(1-x)S2x with a high on/off ratio (>10(4)). Top-gated FET configuration improves the carrier mobility with two orders larger than that in the back-gated FET device. After exposure to air for three months, the device performance manifested excellent stability with no source-drain current drop observed. P-type WSe2(1-x)S2x with a tunable band gap is the ideal complement to n-type tunable monolayers in the application of pn junction-related flexible nanodevices.
What problem does this paper attempt to address?