Hetero-Orientation Epitaxial Growth of TiO 2 Splats on Polycrystalline TiO 2 Substrate

Lin Chen,Guan-Jun Yang
DOI: https://doi.org/10.1007/s11666-018-0722-2
IF: 2.839
2018-01-01
Journal of Thermal Spray Technology
Abstract:In the present study, the effect of titania (TiO 2 ) substrate grain size and orientation on the epitaxial growth of TiO 2 splat was investigated. Interestingly, the splat presented comparable grain size with that of substrate, indicating the hereditary feature of grain size. In addition, hetero- and homo-orientation epitaxial growth was observed at deposition temperatures below 400 °C and above 500 °C, respectively. The preferential growth of high-energy (001) face was also observed at low deposition temperatures (≤ 400 °C), which was found to result from dynamic nonequilibrium effect during the thermal spray deposition. Moreover, thermal spray deposition paves the way for a new approach to prepare high-energy (001) facets of TiO 2 crystals.
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