Abstract:Based on first principles density functional theory (DFT) methods, this study employed the Cambridge Serial Total Energy Package (CASTEP) module within Materials Studio (MS) software under the generalized gradient approximation to investigate the adsorption, diffusion behavior, and electronic properties of hydrogen atoms on α-Fe(110) and α-Fe(110)-Me (Mn, Cr, Ni, Mo) surfaces, including calculations of their adsorption energies and density of states (DOS). The results demonstrated that doping with alloy atoms Me increased the physical adsorption energy of H2 molecules on the surface. Specifically, Mo doping elevated the adsorption energy from −1.00825 eV to −0.70226 eV, with the largest relative change being 30.35%. After doping with Me, the chemical adsorption energy of two hydrogen atoms does not change significantly, among which doping with Cr results in a decrease in the chemical adsorption energy. Building on this, further analysis of the chemical adsorption of single atoms on the surface was conducted. By comparing the adsorption energy and the bond length between a hydrogen atom and iron/dopant metal atom, it was found that Mo doping has the greatest impact, increasing the bond length by 58.58%. Analysis of the DOS functions under different doping conditions validated the interaction between different alloy elements and H atoms. Simultaneously, simulations were carried out on the energy barrier crossed by H atoms diffusing into the metal interior. The results indicate that Ni doping facilitates the diffusion of H atoms, while Cr, Mn, and Mo hinder their diffusion, with Mo having the most significant effect, where its barrier is 21.88 times that of the undoped surface. This conclusion offers deep insights into the impact of different doping elements on hydrogen adsorption and diffusion, aiding in the design of materials resistant to hydrogen embrittlement.

Effect of Cr Doping on the Surface Characteristics of Ni Metal Studied with First-Principles Calculation

Effects of Cr-doping on the adsorption and dissociation of S, SO, and SO2 on Ni(111) surfaces

Site preference of S-doping and its influence on the properties of a Ni/Ni3Al interface

First-principle Study of Interfacial Properties of Ni–Ni3Si Composite

A First-Principles Study on Interfacial Properties of Ni(001)/Ni3Nb(001)

First-principles study on effects of X (Ta, Ti, and W) on the nitriding behavior of ??-Ni3Al in Ni-based superalloys: From the surface adsorption and diffusion of nitrogen

DFT-Based Calculation of Dissolution Activation Energy and Kinetics of Ni–Cr Alloys

Exploration of electrodeposited process of Ni-Co-Cr coating and investigation of Cr doping strengthening mechanism by indentation simulation

Investigation of the Doped Transition Metal Promotion Effect on Co2 Chemisorption on Ni (111)

First‐principle Calculations of CrN(200)/Ni(111) Interface: Atomic Structure, Stability, and Electronic Properties

Accelerating Water Dissociation Kinetics of Ni3N by Tuning Interfacial Orbital Coupling

The Effect of Fe Doping on the Crystallization Kinetics of Ni-Mn-Sn Free-Standing Alloy Thin Films

Effects of N doping on mechanical properties of Fe and interlayer adhesion of Fe with Cr, Ti, and Si: A spin-polarized density functional theory study

Effects of Alloying Element on Hydrogen Adsorption and Diffusion on α-Fe(110) Surfaces: First Principles Study

Comparative research on the interfacial properties of Ni/diamond and Ni/graphene interface with Cr, B, and Si additions by first-principles calculation

Potential Mechanisms of Interstitial Atomic Enhancement and Interface Failure Behavior in Ni3Co/Cu Systems

Enhanced Cu/graphene Adhesion by Doping with Cr and Ti: A First Principles Prediction

NiAl(110)∕Cr(110)interface: A Density Functional Theory Study

Study on the diffusion theory of Cr in Ti-Al alloy(100) surface

Microscopic mechanism of the effect of Nb and Cr co-doping on the strength and ductility of Ti2AlC/Ti3Al coherent interface

Potential Mechanisms of Interstitial Atomic Enhancement and Interface Failure Behavior in Ni 3 Co/Cu Systems