Abstract:Femtosecond laser processing technology is an advanced sub-micro-processing technique that enables the non-contact processing of various materials. This technology can be used to apply sub-micro structures for purposes such as hydrophilicity enhancement, optical transmittance improvement, and photonics detection. However, when it comes to processing micro/nanostructures on highly brittle materials using femtosecond lasers, there are challenges such as low processing efficiency, generation of debris, and microcracking. In this paper, we propose a method called the out-of-focus femtosecond laser direct writing technique combined with wet etching. This method offers simplicity, speed, and flexibility in preparing dense, large-area sub-microstructured surfaces on the brittle material sapphire. Our detailed investigation focuses on the impact of laser processing parameters (direct writing period, distance of focusing, direct writing speed, etc.) on the sub-microstructures of Al2O3 surfaces. The results demonstrate that this method successfully creates embedded sub-microstructures on the sapphire surface. The microholes, with a diameter of approximately 2.0 μm, contain sub-micro structures with a minimum width of 250 ± 20 nm. Additionally, we conducted experiments to assess the optical transmittance of sapphire nanostructures in the range of 350–1200 nm, which exhibited an average transmittance of approximately 77.0%. The water contact angle (CA) test yielded a result of 52 ± 2°, indicating an enhancement in the hydrophilicity of the sapphire nanostructures with only a slight reduction in optical transmittance. Our efficient fabrication of sub-microstructures on the sapphire surface of highly brittle materials offers a promising method for the production and application of brittle materials in the field of micro-optics.

Fabrication of an Anti-Reflective Microstructure on Sapphire by Femtosecond Laser Direct Writing.

Broadband, millimeter-wave anti-reflective structures on sapphire ablated with femto-second laser

Wafer-level Fabrication and Optical Characterization of Nanoscale Patterned Sapphire Substrates

Biomimetic sapphire windows enabled by inside-out femtosecond laser deep-scribing

A Method for Preparing Surface Sub-Microstructures on Sapphire Surfaces Using Femtosecond Laser Processing Technology

Broad-band Anti-Reflective Pore-Like Sub-Wavelength Surface Nanostructures on Sapphire for Optical Windows

Sub-diffraction-limit fabrication of sapphire by femtosecond laser direct writing

Wafer-scale High Aspect-Ratio Sapphire Periodic Nanostructures Fabricated by Self-Modulated Femtosecond Laser Hybrid Technology.

Sapphire-Based Fresnel Zone Plate Fabricated by Femtosecond Laser Direct Writing and Wet Etching

Design and Fabrication of Subwavelength Antireflective Microstructures on Diamond Surfaces

Fabrication of Sapphire Grating by Femtosecond Laser Assisted Etching

Multi-scale Micro-Nano Structures Prepared by Laser Cleaning Assisted Laser Ablation for Broadband Ultralow Reflectivity Silicon Surfaces in Ambient Air

Enhanced Transmission and Self-Cleaning of Patterned Sapphire Substrates Prepared by Wet Chemical Etching Using Silica Masks

Efficient fabrication of infrared antireflective microstructures on a curved Diamond-ZnS composite surface by using femtosecond Bessel-like beams

Fabrication of infrared anti-reflective and protective films on sapphire domes

Millimeter-Wave Broadband Anti-Reflection Coatings Using Laser Ablation of Sub-Wavelength Structures

Rapid fabrication of antireflective structures on ZnS surface by spatial shaping femtosecond laser

Laser micro-structuring of sapphire wafer and fiber

Fabrication of micro hole array on the surface of CVD ZnS by scanning ultrafast pulse laser for antireflection

Formation of Broadband Antireflective and Superhydrophilic Subwavelength Structures on Fused Silica Using One-Step Self-Masking Reactive Ion Etching

Direct Femtosecond Laser Writing of Inverted Array for Broadband Antireflection in the Far-Infrared