Influence of Substrate Orientation on Structural, Ferroelectric and Piezoelectric Properties of Hexagonal YFeO3 Films

Runlan Zhang,Shanxin Xiong,Ming Gong,Xiaoqin Wang,Chunxia Yu,Jinpeng Lan
DOI: https://doi.org/10.1007/s10832-018-0115-4
2018-01-01
Journal of Electroceramics
Abstract:In this study, we fabricated hexagonal YFeO3 films on Si(100) and Si(111) substrates by a sol-gel method, and investigated the effect of substrate orientation on the structural, ferroelectric and piezoelectric properties of the YFeO3 films. Grazing incidence X-ray diffraction reveals that the YFeO3 films on Si(100) and Si(111) have slight preferred-orientation in (110) and (004) direction, respectively. Both films possess granular microstructure with good crystallization, as well as low surface roughness. The (004)-oriented film has higher density than the (110)-oriented film, resulting in lower leakage current. The two films show weak ferroelectric properties and different domain structures. Local amplitude and phase response loops manifest that the film on Si(111) possesses larger phase change and coercive field. While influenced by polarization rotation towards the applied field direction, larger effective piezoelectric coefficient d (33) of 67 pm/V has been found in the film on Si(100). These findings suggest that preferred orientation can account for the physical properties of multiferroic YFeO3 films.
What problem does this paper attempt to address?