Abstract:Automatic wafer prealignment is an important process in wafer manufacturing, whereby its flat edge is set at a predefined angle and its center is set in a predefined position; translational and rotational movement compensate for deviation of the wafer. However, as the traditional wafer prealignment algorithm depends on marked templates at the training stage when the type of wafer is changed, the templates need to be retrained. This paper proposes a new wafer prealignment algorithm, based on Fourier transform for orientation prealignment and least square regression for position prealignment, which will automatically adapt to different types of wafers in 2-D space. Results from experiments with the proposed algorithm on a laser-scribing machine using two types of wafer show that the orientation prealignment achieved an accuracy of 0.05 degrees, the position prealignment achieved an accuracy of 5 pixels, and the average operation time was approximately 1.5 s. As prealignment algorithm therefore meets real-time efficiency and precision requirements, it is suitable for use with semiconductor devices. Note to Practitioners-Because deviation appears when a wafer is first put on the working table, the traditional process is to set up a prealignment system when aligning a new type of wafer. However, different templates increase difficulty for machine operators, and decrease automation and reliability of the devices. This paper therefore proposes a new general prealignment algorithm based on using Fourier transform for orientation prealignment and least square regression for position prealignment. The algorithm was tested on two types of wafer with results showing that the orientation prealignment achieved an accuracy of 0.05 degrees, the position prealignment achieved an accuracy of 5 pixels, and the average operation time was about 1.5 s, all of which meet real-time requirements. Although the algorithm can be adapted to different wafers without adjustment, it does not fit nonquadrilateral chips very well. Accordingly, we will develop an improved algorithm with better generality in due course.

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