Spatioselective Growth on Homogenous Semiconductor Substrates by Surface State Modulation
Lin Han,Jie Lin,Jun Liu,Eli Fahrenkrug,Yalu Guan,Kai Sun,Yiqun Wang,Kong Liu,Zhijie Wang,Zhanguo Wang,Shengchun Qu,Peng Jin
DOI: https://doi.org/10.1021/acs.nanolett.1c00689
IF: 10.8
2021-06-27
Nano Letters
Abstract:Nanofabrication schemes usually suffer challenges in direct growth on complex nanostructured substrates. We provide a new technology that allows for the convenient, selective growth of complex nanostructures directly on three-dimensional (3D) homogeneous semiconductor substrates. The nature of the selectivity is derived from surface states modulated electrochemical deposition. Metals, metal oxides, and compound semiconductor structures can be prepared with high fidelity over a wide scale range from tens of nanometers to hundreds of microns. The utility of the process for photoelectrochemical applications is demonstrated by selectively decorating the sidewalls and tips of silicon microwires with cuprous oxide and cobalt oxides catalysts, respectively. Our findings indicate a new selective fabrication concept applied for homogeneous 3D semiconductor substrates, which is of high promise in community of photoelectronics, photoelectrochemistry, photonics, microelectronics, etc.The Supporting Information is available free of charge at <a class="ext-link" href="/doi/10.1021/acs.nanolett.1c00689?goto=supporting-info">https://pubs.acs.org/doi/10.1021/acs.nanolett.1c00689</a>.Materials and methods, supplementary texts, HRTEM images, SEM images, EDS patterns, UPS spectra, and table of experiment parameters (<a class="ext-link" href="/doi/suppl/10.1021/acs.nanolett.1c00689/suppl_file/nl1c00689_si_001.pdf">PDF</a>)This article has not yet been cited by other publications.
materials science, multidisciplinary,chemistry, physical,physics, applied, condensed matter,nanoscience & nanotechnology