Abstract:Over the last two decades, organic semiconductors have attracted increasing attention because of the applications of their inorganic counterparts in a growing number of devices. At the same time, the further success of these materials will require device processing techniques for organic semiconductors that produce high performance and high integration over large areas. Conventional top-down patterning techniques based on photolithography have served powerful methods for the surface patterning of inorganic materials. However, researchers cannot simply transfer these techniques to organic semiconductors because organic semiconductors can include small, fragile organic molecules. Alternatively, researchers have developed several nonconventional techniques, including shadow mask, printing, and vapor jet writing. However, no leading technique has emerged, and researchers are still trying to realize batch-to-batch, and even device-to-device, reproducibility. This Account summarizes recent research in our group aimed at developing methods for patterning small organic molecules that are compatible with standard device processing procedures for inorganic semiconductors. Our concept is based on classic growth dynamics by gas-phase deposition but leads to different selective growth mechanisms: "pre-patterning and patterned growth" instead of the traditional "film growth and patterning." As a result, both "foreign body" and "step edge", two possible nucleation positions for atoms and molecules during thin film growth process, can be enlarged to the mesotropic scale to define molecules within pre-determined areas. The techniques can do more than patterning. We demonstrate that these techniques can produce heteropatterning of organic structures that cannot be obtained by conventional photolithography and printing techniques. Through a combination of different growth modes, we can separate molecules at given locations on the mesotropic scale, which could lead to applications in the production of organic solar cells. Taking advantage of the differences in emission of molecules in different aggregation states, we can achieve tunable single, double- and triple-color patterns using two types of molecules. We also show that these materials can lead to devices with improved performance in features such as carrier mobility. In addition, we believe that this new photographic compatible procedure in small molecular organic semiconductors can address some issues in device performance, such as carrier transport in organic field effect transistors, by controlling domain size and numbers, and allow researchers to explore new nanoscale properties of these materials. The techniques are still in their infancy, and further research is needed to make them applicable, such as transferring the technology to cheap substrates, for example, glass and flexible plastic. For organic electronics, high-level integration, addressable, and cross-talk free device arrays are critical for producing high-performance devices at a low fabrication cost.

Spatioselective Growth on Homogenous Semiconductor Substrates by Surface State Modulation

Multiple-Patterning Nanosphere Lithography for Fabricating Periodic Three-Dimensional Hierarchical Nanostructures.

Selective growth of semiconducting single-walled carbon nanotubes solely from carbon monoxide

Confined Liquid-Phase Growth of Crystalline Compound Semiconductors on Any Substrate.

Selective‐Area Growth of Aligned Organic Semiconductor Nanowires and Their Device Integration

Growth of Single Crystalline 2D Materials beyond Graphene on Non‐metallic Substrates

Scalable, Green Fabrication of Single-Crystal Noble Metal Films and Nanostructures for Low-Loss Nanotechnology Applications

Inducing nucleation and growth of chalcogenide nanostructures on silicon wafers

3D Printing Nano‐Architected Semiconductors Based on Versatile and Customizable Metal‐Bound Composite Photoresins

Shadow epitaxy for in-situ growth of generic semiconductor/superconductor devices

Area-selective growth of functional molecular architectures

Insights into Growth-Oriented Interfacial Modulation within Semiconductor Multilayers

Self-Assembled Heterostructures: Selective Growth of Metallic Nanoparticles on V-2-VI3 Nanoplates

Strain-Induced Lateral Heterostructures in Patterned Semiconductor Nanomembranes for Micro- and Optoelectronics

Fabricating 3D Si nanostructure via a novel Ga+ implantation enabled maskless dry etching process

Surface-mediated Tunable Self-Assembly of Single Crystal Semimetallic ErSb/GaSb Nanocomposite Structures.

Laser-Assisted Nanoprocessing and Growth of Semiconductor Nanostructures

Unusual Selectivity of Metal Deposition on Tapered Semiconductor Nanostructures

Location-Selective Growth Of Two-Dimensional Metallic/Semiconducting Transition Metal Dichalcogenide Heterostructures

Optical dipole-induced anisotropic growth of semiconductors: A facile strategy toward chiral and complex nanostructures

Photoelectrocatalysis: Spontaneous Electroless Galvanic Cell Deposition of 3D Hierarchical and Interlaced S–M–S Heterostructures (Adv. Mater. 1/2017)