An All-Thin-film Inorganic Electrochromic Device Monolithically Fabricated on Flexible PET/ITO Substrate by Magnetron Sputtering

Qirong Liu,Guobo Dong,Yu Xiao,Fangyuan Gao,Mei Wang,Qi Wang,Shuo Wang,Huaping Zuo,Xungang Diao
DOI: https://doi.org/10.1016/j.matlet.2014.11.151
IF: 3
2015-01-01
Materials Letters
Abstract:In this study, an all-thin-film inorganic electrochromic device was monolithically fabricated on a 10cm×8cm flexible PET/ITO substrate by magnetron sputtering process at room temperature. The device has a complementary structure and consists of five thin films. Tungsten oxide (WO3) and nickel oxide (NiOx) act individually as complementary electrochromic layers. Lithium tantalate (LiTaO3) plays the role of Li+ ions conductor layer and both indium tin oxides (ITO) are adopted as inter-counter transparent conductive electrodes. The complementary device with configuration ITO/NiOx/LiTaO3/WO3/ITO has high optical modulation approximating 63% in the range from 400 to 1600nm and shows the coloration efficiency as high as 68.5cm2C−1. In addition, the response characteristic is investigated for the electrochromic process.
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