Point Defect Concentrations and Interactions in D019-Ti3Al from First-Principles Calculations
TAO Huijin,ZHOU Shan,LIU Yu,YIN Jian,XU Hao
DOI: https://doi.org/10.11900/0412.1961.2016.00464
IF: 1.797
2017-01-01
ACTA METALLURGICA SINICA
Abstract:The intermetallics D019-Ti3Al has low specific density and high thermal resistance for both bulk and coating applications in engineering area.The point defects such as thermal vacancy,compostion vacancy and antisite defect have great influence on the properties of D019-Ti3Al,but are usally neglected.According to available research data from both theory and experiment,it is commonly considered that the thermal vacancies in D019-Ti3Al provide paths for atomic migration and diffusion,the antisite defects play an important role in the disordering of D019-Ti3Al,and the interaction between composition vacancy and antisite defect may have important influence on atomic diffusion and dislocation movement.So it is necessary to explore the mechanism of interaction between composition vacancy and antisite defect for more accurate understanding of the atomic diffusion,dislocation movement and plastic deform in D019-Ti3Al.In this work,the formation enthalpy,equilibrium concentration,and binding energy of composition vacancyand antisite defect in D019-Ti3Al intermetallics were calculated by using both the Wagner-Schottky model of point defect thermodynamics and the plane wave pseudopotential method in first-principles.Results suggest that,in the whole composition range of interest,the point defect concentrations increase with the increase of temperature.In particular,the concentrations of antisite defects are higher than those of vacancies,and the vacancy concentration of Ti is higher than that of Al.At the stoichiometric composition,the concentrations of antisite defects of Ti and Al are very close.At the Ti-rich side of component,the antisite defect of Ti dominates in concentration,while at the Al-rich side,that of Al dominates in concentration.For the calculated results of 3 types of point defect pairs,AlTi-TiAl,TiAl-TiAl and VAl-AlTi,they may have the strong trend to aggregate,while others may show the tend to diffuse into the matrix.