Pressure induced metallization of SiH4(H2)2 via first-principles calculations

Yong Kai Wei,Ni Na Ge,Guang Fu Ji,Xiang Rong Chen,Ling Cang Cai,Dong Qing Wei
DOI: https://doi.org/10.1016/j.commatsci.2014.02.045
IF: 3.572
2014-01-01
Computational Materials Science
Abstract:•X-ray diffraction patterns were obtained to identify the structure of SiH4(H2)2.•The phonon band structure indicates tI18 structure is stable under pressure.•The pressure-induced metallization mechanism of SiH4(H2)2 is analyzed.
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