Tuning the Tunneling Rate and Dielectric Response of Sam-Based Junctions Via A Single Polarizable Atom

Dandan Wang,Davide Fracasso,Argo Nurbawono,Harshini V. Annadata,C. S. Suchand Sangeeth,Li Yuan,Christian A. Nijhuis
DOI: https://doi.org/10.1002/adma.201502968
IF: 29.4
2015-01-01
Advanced Materials
Abstract:The dielectric response and electrical properties of junctions based on self-assembled monolayers (SAMs) of the form S(CH2)11X can be controlled by changing the polarizability of X (here X = H, F, Cl, Br, or I). A 1000-fold increase in the tunneling rate and a four-fold increase of the dielectric constant (ε r ) with increasing polarizability of X are found.
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