Dependence of Si-Faceted Dendrite Growth Orientation on Twin Spacing and Undercooling

Xinbo Yang,K. Fujiwara,K. Maeda,J. Nozawa,H. Koizumi,S. Uda
DOI: https://doi.org/10.1021/cg101721v
IF: 4.01
2011-01-01
Crystal Growth & Design
Abstract:Si-faceted dendrites growth orientation as a function of twin spacing and undercooling were investigated by in situ observation, and the mechanisms of the growth behaviors were discussed and clarified. The growth orientation of Si-faceted dendrites strongly depends on the twin spacing and undercooling. For a given undercooling, a dendrite with twin spacing narrower than the critical twin spacing preferentially grows in the (110) direction, whereas growth in the (112) direction preferentially occurs for a dendrite with twin spacing wider than the critical twin spacing. The critical twin spacing for stable faceted dendrite growth increases as the undercooling increases. In the case of low undercooling (similar to 1.0 K < Delta T less than or similar to 15K), dendrites dominantly grow in the < 112 >> direction. For high undercooling (similar to 25 K< Delta T less than or similar to 100 K), dendrites preferentially grow in the (110) direction. (110) and (112) growth directions occur with equal frequency for intermediate values of undercooling (similar to 15 K < Delta T <= 25 K).
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