Phase Transformation of Nanosized Zro2 Upon Thermal Annealing and Intense Radiation

Fengyuan Lu,Jiaming Zhang,Mengbing Huang,Fereydoon Namavar,Rodney C. Ewing,Jie Lian

DOI: https://doi.org/10.1021/jp109558s

2011-01-01

Abstract:The phase stability and microstructure evolution of zirconia nanofilms on Si substrates prepared by ion beam assisted deposition (IBAD) upon thermal annealing and intensive radiation have been studied by in situ transmission electron microscopy (TEM), ex situ X-ray diffraction, and Raman spectroscopy. For as-prepared amorphous-dominant ZrO2 thin films, a phase transformation sequence of amorphous-to-tetragonal and tetragonal-to-monoclinic has been identified upon increasing annealing temperature from 500, 850, to 1000 degrees C. This phase transformation sequence varying with annealing temperature is accompanied by concomitant grain growth from similar to 5 to similar to 50 nm, consistent with the grain-size-controlled phase stability as a result of total energy crossover among different zirconia polymorphs. Upon ion bombardments of 350 KeV O+ and 1 MeV Kr2+ at room temperature, a monoclinic-to-tetragonal phase transformation was observed in the monoclinic-dominant ZrO2. This monoclinic-to-tetragonal phase transformation may be attributed to the oxygen vacancy accumulation in ZrO2 upon irradiation. Furthermore, both 1 MeV Kr2+ and 350 KeV O+ bombardments on the amorphous-dominant ZrO2 lead to an amorphous-to-tetragonal phase transformation as a result of radiation-induced recrystallization process. Thermodynamically metastable tetragonal ZrO2 phi se can be stabilized at room temperature under intensive radiation by relatively low-energy ion bombardments. These results suggest a method of combining both thermal annealing and ion beam technique for controlling ZrO2 phase stability and thus tailoring materials properties for many engineering applications including actinide host matrix for advanced nuclear energy systems.