Densely aligned graphene nanoribbons at ∼35 nm pitch

Liying Jiao,Liming Xie,Hongjie Dai
DOI: https://doi.org/10.1007/s12274-012-0209-2
IF: 9.9
2012-01-01
Nano Research
Abstract:We demonstrate the fabrication of high-density aligned graphene nanoribbon (GNR) arrays by plasma etching of graphene sheets through a nanomask derived from self-assembled poly (styrene- block -dimethylsiloxane) (PS-PDMS) diblock copolymer films. This approach produces parallel GNR (∼12 nm wide) arrays at ∼35 nm pitch. Microscopy and polarized Raman spectroscopy are used to reveal the high-degree of alignment of GNRs. Electrical measurements show that parallel GNRs in a 1 μm wide region can deliver ∼0.38 mA current at a source-drain bias of 1 V. This novel patterning approach allows for the fabrication of densely aligned GNR arrays on various substrates and could provide a route to large scale integration of GNRs into nanoelectronics, optoelectronics and biosensors.
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