Effect of Si Addition on the Microstructure and Room Temperature Tensile Properties of High Nb-Tial Alloy

Yang Liang,Gao Shubo,Wang Yanli,Ye Teng,Song Lin,Lin Junpin
DOI: https://doi.org/10.11900/0412.1961.2015.00075
IF: 1.797
2015-01-01
ACTA METALLURGICA SINICA
Abstract:High Nb-TiAl alloys, which being regarded as a new generation TiAl alloy, had attracted more and more attention for their higher operating temperature and better oxidation resistance than conventional TiAl alloys. It was found that silicide particles in high Nb-TiAl alloys were Nb5Si3 rather than Ti5Si3 precipitated in TiAl alloys. In this work, the effect of Nb5Si3 phase on the microstructure and room-temperature tensile properties of high Nb-TiAl alloy was studied. The experimental results showed that the precipitation temperature of silicide was between 1000 similar to 1200 degrees C. Precipitates located in the colony boundary, beta(B2) segregation and between gamma/alpha(2) lamella. The tensile properties of as-cast alloy with Si addition increased. Because the formation of Nb5Si3 precipitates resulted in the reduction of Nb content, which was one of beta(B2) phase stable elements. Therefore, the volume fraction of beta(B2) phase obviously decreased due to Si addition. However, after heat treatments, the tensile properties of Si containing high Nb-TiAl alloy gradually reduced with the increasing of heat treatment temperature. Silicide particles which precipitated along lamella leaded to generation and propagation of cracks. Moreover, silicide particles further precipitated due to tensile stress which increased the rate of crack propagation. Si addition leaded to gamma phase area expanded. gamma single-phase region formed between 1280 similar to 1300 degrees C. Silicide precipitated in colony boundary resulted in bulk gamma+beta(B2) phases, which weaken the grain boundaries. While suicide precipitated in lamella leaded to formation of secondary gamma lath which split the initial lamella microstructure.
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