Temperature Field Analysis of High Reflection Film Induced by Long-Pulse and Short-Pulse Lasers under Different Irradiation Angles

Hongjing Li,Zhonghua Shen,Xiaowu Ni
DOI: https://doi.org/10.1016/j.ijleo.2015.08.044
IF: 3.1
2015-01-01
Optik
Abstract:Modeling laser beam as a tapered wave with a Gaussian spectrum, The temperature fields in HfO2/SiO2 high-reflection (HR) film, induced by 1ms long-pulse and 10ns short-pulse lasers, under different incident angles are calculated. The damage differences between long-pulse and short-pulse-induced damage in the HR film are analyzed. The results show for long-pulse laser, the temperature distribution is much less affected by the laser field effect than short-pulse case. Furthermore, as the irradiation angles increase from 0 to 35° for 1ms and 10ns lasers, the peak temperature rises in the HR film increase for s polarized laser. Other than long-pulse laser, for short-pulse laser, the positions of the peak temperature shift gradually toward the air–film interface as the incident angle increases, which may have a great influence on the position of thermal stress coupling and damage probability.
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