Decomposition of Catechol and Carbonaceous Residues on TiO2(110): A Model System for Cleaning of Extreme Ultraviolet Lithography Optics

Peter Jacobson,Shao-Chun Li,Chuandao Wang,Ulrike Diebold
DOI: https://doi.org/10.1116/1.3002566
2008-01-01
Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena
Abstract:High energy photons used to expose photoresists in extreme ultraviolet lithography (92eV, 13.5nm) photoexcite electrons from Mo∕Si multilayer mirror surfaces. Photoemitted electrons participate in the formation of carbonaceous residues on the mirror surface significantly affecting the mirror reflectivity. We explore mitigation strategies utilizing TiO2(110) as a model for the capping layer. Two carbon containing surfaces are examined; an ordered catechol monolayer and a carbonaceous layer. Excimer laser sources (XeF and KrF) coupled with oxidizing gas backgrounds (NO and O2) are shown to be effective for the photocatalytic removal of carbon. Utilizing x-ray photoemission spectroscopy and scanning tunneling microscopy carbon removal is shown to proceed through oxidation of the overlayer.
What problem does this paper attempt to address?