Characterization of a nanometer-thick sputtered polytetrafluoroethylene film

Lei Li,Paul M. Jones,Yiao-Tee Hsia
DOI: https://doi.org/10.1016/j.apsusc.2010.12.104
IF: 6.7
2011-01-01
Applied Surface Science
Abstract:Fast growth of nanotechnology, e. g. hard disk drive (HDD) and microelectromechanical system/nanoelectromechanical system (MEMS/NEMS), requires nanometer-thick protection films with high thermal stability and low surface energy. In this paper, we report the characterization results of a nanometer-thick sputtered polytetrafluoroethylene (PTFE) film prepared by radio frequency (RF) sputtering. Atomic force microscopy (AFM) and X-ray reflectivity (XRR) results show that the nanometer-thick sputtered PTFE film has good uniformity. Thermally programmed desorption (TPD) results show that the film is thermally stable up to 430 degrees C. Surface energy measurement via contact angle method shows that the film has low surface energy with the thickness as low as 1.5 nm. X-ray photoelectron spectroscopy (XPS) data suggests that the film has crosslinked molecular structure, which results in amorphous morphology as shown by X-ray diffraction (XRD) data. Nano-indentation testing shows that the sputtered film has higher hardness and modulus than bulk PTFE. The structure-property relationship has been discussed. (C) 2010 Elsevier B. V. All rights reserved.
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