Microstructure and electrical properties of praseodymium oxide doped Bi2O3 based ZnO varistor films

dong xu,ke he,r h yu,yin tong,j p qi,x j sun,y t yang,h x xu,h m yuan,jie ma
DOI: https://doi.org/10.1179/1753555714Y.0000000242
2015-01-01
Materials Technology
Abstract:Pr2O3 and Pr6O11 doped ZnO thin films were prepared by the sol-gel method respectively. The microstructure and electrical characteristics of the samples were investigated by X-ray diffraction (XRD), atomic force microscopy (AFM), varistor dc parameter analyser and impedance analyser. Two kinds of Pr-oxide doped ZnO thin film with similar phase which contain well crystallised ZnO. The grains of Pr2O3 doped ZnO thin films and Pr6O11 doped ZnO thin films are uniform and closely packed, and all samples have lower surface roughness. When the doping content of Pr2O3 is 0.90 mol.-%, the varistor properties of ZnO thin film are optimum, the leakage current is 487 mu A, the potential gradient is 232 V mm(-1) and the nonlinear coefficient is 2.5. The dielectric constant of ZnO thin films increases in a certain degree with different contents of Pr2O3 and Pr6O11 doping. The Pr2O3 doping reduces the dielectric loss effectively, but the Pr6O11 doping has the opposite effect. These results provide favourable theoretical and experimental basis to optimise and extend electrical application of ZnO thin film.
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