Fabrication of nano-patterns using quick gel-nanoimprint process

shinji araki,min zhang,takahiro doe,li lu,masahiro horita,takashi nishida,yasuaki ishikawa,yukiharu uraoka
DOI: https://doi.org/10.1109/IMFEDK.2012.6218583
2012-01-01
Abstract:We investigated a quick patterning using gel-nanoimprint process for zinc oxide (ZnO) thin films. The X-ray diffraction measurement revealed that the ZnO films had wurtzite structure by annealing in the ambient air or oxygen. The ZnO film annealed in oxygen exhibited higher refractive index of 1.92 (at 720 nm for wavelength of light) which is close to that of a conventional ZnO film, whereas that of ZnO film annealed in air atmosphere provided very low value of 1.64. The width of ZnO patterns was in good agreement with that of a polydimethylsiloxane mold.
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