Tunable channel width of a UV-gate field effect transistor based on ZnO micro-nano wire

xin zheng,yihui sun,xiaoqin yan,xiang chen,zhiming bai,pei lin,yanwei shen,yanguang zhao,yue zhang
DOI: https://doi.org/10.1039/c4ra01661k
IF: 4.036
2014-01-01
RSC Advances
Abstract:A n-channel field effect transistor (FET) based on ZnO microwire has been fabricated for ultraviolet detection, where a PEDOT: PSS/ZnO wire junction serves as the gate. The sensitivity of the junction FET was enhanced by two orders of magnitude with a fast response time <1 s at 3 V compared with a AgZnO-Ag detector under the illumination of UV light (325 nm). Such a great improvement in photoresponse is attributed to the introduction of a depletion layer, resulting in a lower dark current. The change of the junction FET channel width with various UV light intensities was calculated and discussed in terms of the carrier diffusion theory and the ideal I-V characteristics of the depletion mode JFET.
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