Abstract:The Journal of Chemical Physics, Volume 0, Issue ja, -Not available-. Fluorination of graphene sheets with Xenon difluoride leads to the formation of the widest band gap Gr derivative, namely Fluorographene. Accurate experimental observations distinguish a two stages mechanism in the fluorination procedure, the half-fluorination stage wherein one side of the Gr sheet is rapidly fluorinated and then the full-fluorination stage involving much slower fluorination of the opposite side of the sheet [Nature Comm. 5, 1 (2014)]. Here, we perform comprehensive density functional calculations to illustrate accurate microscopic insights into the much slower rate of the full-fluorination stage, compared with the half-fluorination one. The calculated minimum energy paths for the half- and full-fluorination processes demonstrate much enhanced fluorine adsorption after the half-fluorination stage, which sounds inconsistent with the experimental picture. This ambiguity is explained in terms of significant chemical activation of the graphene sheet after half-fluorination, which remarkably facilitates the formation of chemical contaminants in the system and thus substantially slows down the full-fluorination procedure. After considering the binding energy and durability of the relevant chemical species, including hydrogen, oxygen, and nitrogen molecules and xenon atom, it is argued that oxygen-fluorine ligands are the most likely chemical contaminants opposing the complete fluorination of a graphene sheet. Then, we propose an oxygen desorption mechanism to carefully explain much enhanced rate of the full-fluorination procedure at elevated temperatures. The potential photocatalytic application of the pristine and defected samples in water splitting and carbon dioxide reduction reactions are also discussed.

A theoretical study of fluorographene as substrates for mono-/Bi-layer graphene

Graphene With Patterned Fluorination: Morphology Modulation And Implications

Fluorinated graphene: Fluorographene: A Two-Dimensional Counterpart of Teflon (Small 24/2010)

Enhance the Fluorination Activity of Graphene Via the Interfacial Interaction from Ni(1 1 1) Substrate

Fluorographene: Two Dimensional Counterpart of Teflon

Reversible Fluorination of Graphene: towards a Two-Dimensional Wide Bandgap Semiconductor

Ultra-strong stability of double-sided fluorinated monolayer graphene and its electrical property characterization

Novel First-Principles Insights into Graphene Fluorination

Ab Initio Optical Study of Graphene on Hexagonal Boron Nitride and Fluorographene Substrates

Preferential and Reversible Fluorination of Monolayer Graphene

Two‐Dimensional Fluorinated Graphene: Synthesis, Structures, Properties and Applications

New polymorphic varieties of fluorographene forming during fluorine functionalization of 4-8 graphene layers

Fluorinated Graphene: Fluorinated Graphene in Interface Engineering of Ge‐Based Nanoelectronics (adv. Funct. Mater. 12/2015)

Electronic and magnetic properties of graphene-fluorographene nanoribbons: Controllable semiconductor-metal transition

Effect of Fluorine Patterns on Electronic Transport in Fluorinated Graphene

Tuning the electronic transport properties of graphene through functionalisation with fluorine

Electrically tunable resonant scattering in fluorinated bilayer graphene

Absence of stable atomic structure in fluorinated graphene

Essential Properties of Fluorinated Graphene and Graphene Nanoribbons

Electron properties of fluorinated single-layer graphene transistors

Interface engineering of epitaxial graphene on SiC() via fluorine intercalation: A first principles study