Fluorographene: Two Dimensional Counterpart of Teflon

R. R. Nair,W. C. Ren,R. Jalil,I. Riaz,V. G. Kravets,L. Britnell,P. Blake,F. Schedin,A. S. Mayorov,S. Yuan,M. I. Katsnelson,H. M. Cheng,W. Strupinski,L. G. Bulusheva,A. V. Okotrub,I. V. Grigorieva,A. N. Grigorenko,K. S. Novoselov,A. K. Geim
DOI: https://doi.org/10.1002/smll.201001555
IF: 13.3
2010-01-01
Small
Abstract:A stoichiometric derivative of graphene with a fluorine atom attached to each carbon is reported. Raman, optical, structural, micromechanical, and transport studies show that the material is qualitatively different from the known graphene-based nonstoichiometric derivatives. Fluorographene is a high-quality insulator (resistivity >10(12) Omega) with an optical gap of 3 eV. It inherits the mechanical strength of graphene, exhibiting a Young's modulus of 100 N m(-1) and sustaining strains of 15%. Fluorographene is inert and stable up to 400 degrees C even in air, similar to Teflon.
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