Realization of Controllable Graphene P–n Junctions Through Gate Dielectric Engineering

J. X. Wang,Q. Q. Huang,C. L. Wu,Z. J. Wei,N. N. Xuan,Z. Z. Sun,Y. Y. Fu,R. Huang
DOI: https://doi.org/10.1039/c5ra10921c
IF: 4.036
2015-01-01
RSC Advances
Abstract:A novel step-dielectric design to modulate the doping profile in monolayer graphene is proposed, and junction formation with appreciable abruptness and excellent controllability are verified.
What problem does this paper attempt to address?