Abstract:Laser cleaning has the advances of environmental friendliness, high quality and efficiency, no secondary damage, simple process, safety and reliability, easy to realize automation and low operation and maintenance costs. The application in manufacturing and remanufacturing fields such as aerospace, automobile manufacturing, shipbuilding, and electronics industry is becoming increasingly widespread. Laser cleaning exerts an integrated effect through photon pressure, thermal ablation, vibrational waves, and plasma bursts, facilitating high-quality and efficient surface cleaning of substrates. The thermal effects serve as the primary mechanism driving thermal ablation and plasma bursts, predominantly governing most cleaning scenarios. The laser's thermal effects are employed to eliminate surface contaminants, yet its residual influence may concurrently inflict damage on the substrate. How to avoid substrate damage is a challenge for the engineering of laser cleaning technology. This paper focuses on the thermal effects and minimizing damage in laser cleaning. The mechanism of contaminants removal by thermal effects and the influence of residual thermal radiation on the substrate surface are comprehensively explained. The thermal response characteristics of substrate surface are clarified for different pulse widths, scanning speeds and energy densities. Theoretical validation analysis was performed by means of simulation. The feasibility of using laser-induced breakdown spectroscopy and photoacoustic techniques for real-time monitoring of substrate damage is discussed. Studies have demonstrated that the application of diverse cleaning methods, the selection of appropriate laser parameters, and real-time monitoring of the cleaning state can achieve the dual objectives of efficient cleaning and maintaining the integrity of the substrate.

Liquid-assisted Pulsed Laser Cleaning with Near-Infrared and Ultraviolet Pulsed Lasers

Efficiency studies of particle removal with pulsed-laser induced plasma

Lower size limit of particle removal in liquid-assisted laser cleaning

Laser surface cleaning of simulated radioactive contaminants in various technological environments

A review of thermal effects and substrate damage control in laser cleaning

Elimination of blind zone in nanoparticle removal on silicon wafers using a double-beam laser shockwave cleaning process

Non-contact removal of 60-nm latex particles from silicon wafers with laser-induced plasma

Study on the Surface Morphology of Micro-Particles and the Oxide Layer on Silicon Carbide Crystal Using Nanosecond Green Laser Cleaning Assisted with Airflow

Removal mechanism of laser cleaning for inorganic thermal control coatings on aluminum alloys

Nanosecond pulsed laser cleaning of titanium alloy oxide films: Modeling and experiments

Reduced threshold ultraviolet laser ablation of glass substrates with surface particle coverage: A mechanism for systematic surface laser damage

Experimental and numerical simulation analysis of laser paint removal of aluminum alloy

Removal of Particle Contaminations on Sol-Gel Coated Fused Silica Surface by Laser Cleaning

Laser ablation in liquid: bridge from a plasma stage to bubble formation

Laser damage thresholds of ITER mirror materials and first results on in situ laser cleaning of stainless steel mirrors

Removal mechanism of surface cleaning on TA15 titanium alloy using nanosecond pulsed laser

Nanostructured intense-laser cleaner

A method of laser micro-polishing for metallic surface using UV nano-second pulse and CW lasers

Reduction of heating rate in a microfabricated ion trap by pulsed-laser cleaning

Laser-induced ablation of metal in liquid

Numerical simulation and experiments of nano-second pulsed laser cleaning titanium alloy oxide film