Reversible Semiconductor-To-Metal Transition of VO X Thin Films Prepared by the Sol-Gel Method

LS HOU,SW LU,FX GAN
DOI: https://doi.org/10.1117/12.961470
1989-01-01
Abstract:Using VO(i-0C3H7)3 as the starting material VOx thin films have been prepared on silica glass substrates by the Sol-Gel dip-coating method and the subsequent heat treatment under vacuum conditions. These thin films show a reversible semiconductor-to-metal phase transition at 67°C. The change of transmittance in the near IR region due to the phase transition is as high as 50%. Infrared spectra show that the value of x is close to 2.
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